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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
Issue Dt:
11/13/2001
Application #:
09539114
Filing Dt:
03/30/2000
Inventors:
Michihiko Yanagisawa, Shinya Iida, Yasuhiro Horiike
Title:
Corrision-resistant system and method for a plasma etching apparatus
Assignment: 1
Reel/Frame:
012098/0009Recorded: 09/18/2000Pages: 2
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
05/28/2000
Exec Dt:
05/12/2000
Exec Dt:
05/25/2000
Assignee:
4TH FLOOR
747 THIRD AVENUE
NEW YORK, NEW YORK 10017
Correspondent:
BLANK ROME COMISKY & MCCAULEY LLP
DAVID EDMONDSON
THE FARRAGUT BUILDING
SUITE 1000, 900 17TH STREET, NW
WASHINGTON, DC 20006
Assignment: 2
Reel/Frame:
013119/0973Recorded: 07/24/2002Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignor:
Exec Dt:
02/02/2001
Assignee:
MICHIGAN STATE UNIVERSITY
238 ADMINISTRATION BLDG
EAST LANSING, MICHIGAN 48824
Correspondent:
MCLEOD & MOYNE, P.C.
IAN C. MCLEOD
2190 COMMONS PARKWAY
OKEMOS, MI 48864

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