Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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04/09/2002
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Application #:
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09056955
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Filing Dt:
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04/08/1998
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Inventor:
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HIDETOSHI OHNUMA
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Title:
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METHOD OF CORRECTING DESIGNED-PATTERN DATA, METHOD OF ELECTRON BEAM EXPOSURE, PHOTOMASK AND METHOD OF FABRICATION THEREOF, METHOD OF OPTICAL EXPOSURE, SEMICONDUCTOR DEVICE AND METHOD OF FABRICATION THEREOF, AND APPARATUS FOR CORRECTING DESIGNED-PATTERN DATA
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 7-35 KITASHINAGAWA 6-CHOME |
| SHINAGAWA-KU TOKYO, JAPAN |
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| RADER, FISHMAN & GRAUER |
| RONALD P. KANANEN, ESQ. |
| SUITE 501, 1233 20TH STREET, NW |
| WASHINGTON, D.C. 20036 |
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