Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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06/11/2002
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Application #:
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09524024
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Filing Dt:
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03/10/2000
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Inventors:
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Jae Chang Jung, Jin Soo Kim, Hyoung Gi Kim
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Title:
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PROCESS FOR FORMING A PHOTORESIST PATTERN IMPROVING RESISTANCE TO POST EXPOSURE DELAY EFFECT
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| SAN 136-1, AMI-RI BUBAL-EUB, ICHON-SHI |
| KYOUNGKI-DO, KOREA, REPUBLIC OF 467-8 |
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| TOWNSEND AND TOWNSEND AND CREW LLP |
| MART C. MATTHEWS |
| TWO EMBARCADERO CENTER, 8TH FLOOR |
| SAN FRANCISCO, CA 94111-3834 |
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