Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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07/26/2005
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Application #:
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10362855
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Filing Dt:
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02/26/2003
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Publication #:
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Pub Dt:
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10/09/2003
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Inventors:
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Kazuyuki Nitta, Takeyoshi Mimura, Satoshi Shimatani, Waki Okubo, Tatsuya Matsumi
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Title:
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POSITIVE RESIST COMPOSITION OF CHEMICAL AMPLIFICATION TYPE, RESIST COATED MATERIAL, METHOD OF FORMING RESIST PATTERN, AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 150, NAKAMARUKO |
| NAKAHARA-KU, KAWASAKI-SHI |
| KANAGAWA-KEN, JAPAN |
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| HOFFMAN & BARON LLP |
| CHARLES R. HOFFMAN |
| 6900 JERICHO TURNPIKE |
| SYOSSET, NY 11791 |
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