Patent Assignment Abstract of Title
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Total Assignments:
3
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Patent #:
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Issue Dt:
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01/31/2006
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Application #:
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09597161
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Filing Dt:
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06/20/2000
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Inventors:
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Ichiro Okabe, Hiroki Arai
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Title:
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METHOD OF FORMING A FINE PATTERN USING A SILICON-OXIDE-BASED FILM, SEMICONDUCTOR DEVICE WITH A SILICON-OXIDE-BASED FILM AND METHOD OF MANUFACTURE THEREOF
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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292 YOSHIDA-CHO, TOTSUKA-KU |
YOKOHAMA, KANAGAWA 244-0817, JAPAN |
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23-1, 6-CHOME, NAGAYAMA |
TAMA-SHI, TOKYO 206-0025, JAPAN |
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FOLEY & LARDNER |
WILLIAM T. ELLIS |
WASHINGTON HARBOUR |
3000 K. STREET, NW - SUITE 500 |
WASHINGTON, D.C. 20007-5109 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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22-22, NAGALKE-CHO, ABENO-KU, OSAKA-SHI |
OSAKA, 545-8522, JAPAN |
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FOLEY & LARDNER LLP |
WILLIAM T. ELLIS |
3000 K STREET, N.W., SUITE 500 |
WASHINGTON HARBOUR |
WASHINGTON, D.C. 20007-5143 |
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Assignment:
3
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ASSIGNEE'S ADDRESS CORRECTION
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22-22, NAGAIKE, ABENO-KU, OSAKA-SHI |
OSAKA 545-8522, JAPAN |
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WILLIAM T. ELLIS |
FOLEY & LARDNER LLP |
WASHINGTON HARBOUR |
3000 K STREET, N.W., SUITE 500 |
WASHINGTON, D.C. 20007-5143 |
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