Patent Assignment Abstract of Title
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Total Assignments:
3
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Patent #:
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Issue Dt:
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05/02/2006
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Application #:
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10689666
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Filing Dt:
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10/22/2003
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Publication #:
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Pub Dt:
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05/06/2004
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Inventors:
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Eiji Aoki, Shinji Kobayashi, Toshiyuki Marumo, Shinji Akima
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Title:
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PHOTOMASK DEFECT TESTING METHOD, PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR INTEGRATED CIRCUIT MANUFACTURING METHOD
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 22-22, NAGAIKE-CHO, ABENO-KU, OSAKA-SHI |
| OSAKA, JAPAN 545-8522 |
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| 5-1, TAITO 1-CHOME, TAITO-KU |
| TOKYO, JAPAN 110-8560 |
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| NIXON & VANDERHYE, P.C. |
| H. WARREN BURNAM, JR. |
| 1100 NORTH GLEBE ROAD |
| 8TH FLOOR |
| ARLINGTON, VA 22201 |
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Assignment:
2
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CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
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| 5-1, TAITO 1-CHOME, TAITO-KU |
| TOKYO, JAPAN |
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| CPA GLOBAL LIMITED |
| LIBERATION HOUSE |
| CASTLE STREET |
| ST. HELIER, JI1 1BL JERSEY |
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Assignment:
3
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| 3-19-26, SHIBAURA, MINATO-KU |
| TOKYO, JAPAN |
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| CPA GLOBAL LIMITED |
| LIBERATION HOUSE |
| CASTLE STREET |
| ST. HELIER, JI1 1BL JERSEY |
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