Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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06/06/2006
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Application #:
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10011421
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Filing Dt:
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12/04/2001
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Publication #:
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Pub Dt:
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04/18/2002
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Inventors:
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Keiichiro Tounai, Takeshi Hamamoto
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Title:
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OPTICAL PROXIMITY EFFECT CORRECTING METHOD AND MASK DATA FORMING METHOD IN SEMICONDUCTOR MANUFACTURING PROCESS, WHICH CAN SUFFICIENTLY CORRECT OPTICAL PROXIMITY EFFECT, EVEN UNDER VARIOUS
SITUATIONS WITH REGARD TO SIZE AND SHAPE OF DESIGN PATTERN, AND SPACE WIDTH A
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 1753 SHIMONUMABE, NAKAHARA-KU, KAWASAKI |
| KANAGAWA 211-8668, JAPAN |
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| HAYES SOLSOWAY P.C. |
| NORMAN P. SOLOWAY |
| 130 W. CUSHING STREET |
| TUCSON, AZ 85701 |
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Assignment:
2
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CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
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| 1753 SHIMONUMABE, NAKAHARA-KU, |
| KAWASAKI-SHI, KANAGAWA, JAPAN 211-8668 |
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| SUGHRUE MION, PLLC |
| 2100 PENNSYLVANIA AVENUE, N.W. |
| SUITE 800 |
| WASHINGTON, DC 20037 |
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