Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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10/24/2006
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Application #:
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10720735
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Filing Dt:
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11/24/2003
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Publication #:
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Pub Dt:
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01/13/2005
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Inventors:
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Yu-Lin Yen, Ching-Yu Chang
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Title:
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REWORK PROCESS OF PATTERNED PHOTO-RESIST LAYER
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| NO. 16, LI-HSIN RD. |
| SCIENCE-BASED INDUSTRIAL PARK |
| HSINCH, TAIWAN R.O.C. |
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| THOMAS, KAYDEN, HORSTEMEYER & RISLEY LLP |
| DANIEL R. MCCLURE |
| 100 GALLERIA PARKWAY |
| STE. 1750 |
| ATLANTA, GA 30339-5948 |
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