Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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01/05/2010
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Application #:
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11340249
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Filing Dt:
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01/26/2006
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Publication #:
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Pub Dt:
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07/26/2007
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Inventors:
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Chia-Jen Chen, Hsin-Chang Lee, Hung Chang Hsieh
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Title:
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NEW APERTURE DESIGN FOR IMPROVING CRITICAL DIMENSION ACCURACY AND ELECTRON BEAM LITHOGRAPHY THROUGHPUT
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| NO. 8, LI-HSIN RD. 6 |
| SCIENCE-BASED INDUSTRIAL PARK |
| HSIN-CHU, TAIWAN 300-77 |
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| HAYNES AND BOONE, LLP |
| 901 MAIN STREET, SUITE 3100 |
| DALLAS, TX 75202 |
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