Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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03/23/2010
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Application #:
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11062437
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Filing Dt:
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02/23/2005
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Publication #:
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Pub Dt:
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08/25/2005
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Inventors:
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Kazuya Fukuhara, Daisuke Kawamura, Shoji Mimotogi
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Title:
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MASK DATA CORRECTION METHOD, PHOTOMASK MANUFACTURING METHOD, COMPUTER PROGRAM, OPTICAL IMAGE PREDICTION METHOD, RESIST PATTERN SHAPE PREDICTION METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 1-1, SHIBAURA 1-CHOME, MINATO-KU |
| TOKYO 105-8001, JAPAN |
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| ERNEST F. CHAPMAN |
| FINNEGAN, HENDERSON, FARABOW ET AL. |
| 901 NEW YORK AVE. |
| WASHINGTON, D.C. 20001-4413 |
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