Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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07/20/2010
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Application #:
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11578814
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Filing Dt:
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10/19/2006
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Publication #:
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Pub Dt:
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11/01/2007
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Inventors:
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Susumu Maeda, Takahisa Sugiman, Shinya Sadohara, Shiro Yoshino, Kouzo Nakamura
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Title:
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SILICON SEMICONDUCTOR SUBSTRATE HEAT-TREATMENT METHOD AND SILICON SEMICONDUCTOR SUBSTRATE TREATED BY THE METHOD
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 25-1, SHINOMIYA 3-CHOME, HIRATSUKA-SHI |
| KANAGAWA 254-0014, JAPAN |
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| J. ROBIN ROHLICEK, J.D., PH.D. |
| FISH & RICHARDSON P.C. |
| 225 FRANKLIN STREET |
| BOSTON, MA 02110 |
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Assignment:
2
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CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
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| 25-1, SHINOMIYA 3- CHOME, HIRATSUKA-SHI |
| KANAGAWA, JAPAN 254-0014 |
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| OCCHIUTI ROHLICEK & TSAO LLP |
| 10 FAWCETT STREET |
| CAMBRIDGE, MA 02138 |
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