Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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10/05/2010
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Application #:
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11689389
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Filing Dt:
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03/21/2007
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Publication #:
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Pub Dt:
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09/25/2008
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Inventors:
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Jong Mun Kim, Judy Wang, Ajey M. Joshi, Jingbao Liu, Bryan Y. Pu
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Title:
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HALOGEN-FREE AMORPHOUS CARBON MASK ETCH HAVING HIGH SELECTIVITY TO PHOTORESIST
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 3050 BOWERS AVE. |
| SANTA CLARA, CALIFORNIA 95054 |
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| APPLIED MATERIALS, INC. |
| P.O. BOX 450A |
| PATENT COUNSEL |
| SANTA CLARA, CA 95052 |
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