Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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12/14/2010
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Application #:
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11948631
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Filing Dt:
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11/30/2007
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Publication #:
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Pub Dt:
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06/04/2009
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Inventors:
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Woo Yung Jung, Guee Hwang Sim
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Title:
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METHOD OF FORMING AN ETCHING MASK PATTERN FROM DEVELOPED NEGATIVE AND POSITIVE PHOTORESIST LAYERS
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| SAN 136-1, AMI-RI, BUBAL-EUB, KYOUNGKI-DO |
| ICHEON-SI, KOREA, REPUBLIC OF |
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| BARMAK SANI |
| TOWNSEND AND TOWNSEND AND CREW LLP |
| TWO EMBARCADERO CENTER, EIGHTH FLOOR |
| SAN FRANCISCO, CA 94111-3834 |
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