Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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05/20/2014
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Application #:
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13742689
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Filing Dt:
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01/16/2013
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Inventors:
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I-Fan LIN, Hsiao-Shu CHAO, Meng-Fan WU, Ke-Ying SU, Yi-Kan CHENG
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Title:
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METHOD AND SYSTEM FOR PHOTOMASK ASSIGNMENT FOR DOUBLE PATTERNING TECHNOLOGY
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| NO. 8, LI-HSIN ROAD 6 |
| SCIENCE-BASED INDUSTRIAL PARK |
| HSIN-CHU, TAIWAN 300-77 |
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| DUANE MORRIS LLP (TSMC) IP DEPARTMENT |
| 30 SOUTH 17TH STREET |
| PHILADELPHIA, PA 19103-4196 |
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