Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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10/28/2014
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Application #:
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13427206
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Filing Dt:
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03/22/2012
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Publication #:
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Pub Dt:
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09/27/2012
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Inventor:
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Eiji YAMANAKA
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Title:
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METHOD FOR EXTRACTING CONTOUR OF PATTERN ON PHOTO MASK, CONTOUR EXTRACTION APPARATUS, METHOD FOR GUARANTEEING PHOTO MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
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Assignment:
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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1-1, SHIBAURA 1-CHOME |
MINATO-KU, TOKYO, JAPAN 105-8001 |
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FINNEGAN |
901 NEW YORK AVENUE, NW |
WASHINGTON, DC 20001 |
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