Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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03/08/2016
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Application #:
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14301835
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Filing Dt:
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06/11/2014
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Publication #:
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Pub Dt:
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12/18/2014
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Inventors:
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BANQIU WU, AJAY KUMAR, RAO YALAMANCHILI, OMKARAM NALAMASU
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Title:
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METHODS FOR REDUCING LINE WIDTH ROUGHNESS AND/OR CRITICAL DIMENSION NONUNIFORMITY IN A PATTERNED PHOTORESIST LAYER
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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3050 BOWERS AVENUE |
SANTA CLARA, CALIFORNIA 95054 |
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MOSER TABOADA/ALAN TABOADA |
1030 BROAD STREET |
SUITE 203 |
SHREWSBURY, NJ 07702 |
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