Patent Assignment Abstract of Title
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
Total Assignments:
1
|
|
Patent #:
|
|
Issue Dt:
|
03/15/2016
|
Application #:
|
14497560
|
Filing Dt:
|
09/26/2014
|
|
Publication #:
|
|
Pub Dt:
|
01/08/2015
| | | | |
|
Inventors:
|
Tomotaka TSUCHIMURA, Takeshi INASAKI, Takuya TSURUTA, Koutarou TAKAHASHI
|
|
Title:
|
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION
|
|
|
Assignment:
1
|
|
|
|
|
|
|
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
|
|
|
|
|
|
|
|
|
| 26-30, NISHIAZABU 2-CHOME, MINATO-KU |
| TOKYO, JAPAN |
|
|
|
|
| SUGHRUE-265550 |
| 2100 PENNSYLVANIA AVE. NW |
| WASHINGTON, DC 20037-3213 |
|
|
Search Results as of:
08/07/2025 09:53 PM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|
