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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
09741450
Filing Dt:
12/19/2000
Publication #:
Pub Dt:
06/21/2001
Inventor:
David R. Wheeler
Title:
Refractory bilayer resist materials for lithography using highly attenuated radiation
Assignment: 1
Reel/Frame:
011951/0808Recorded: 06/26/2001Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignor:
Exec Dt:
03/14/2001
Assignee:
2200 MISSION COLLEGE BLVD. - MS SCI-02
SANTA CLARA, CALIFORNIA 95052
Correspondent:
KURT C. OLSEN
SANDIA NATIONAL LABS, MS 9031
P.O. BOX 969
LIVERMORE, CA 94551-0969

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