Patent Assignment Abstract of Title
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
Total Assignments:
1
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
10011420
|
Filing Dt:
|
12/04/2001
|
|
Publication #:
|
|
Pub Dt:
|
04/25/2002
| | | | |
|
Inventors:
|
Keiichiro Tounai, Takeshi Hamamoto
|
|
Title:
|
Optical proximity effect correcting method and mask data forming method in semiconductor manufacturing process, which can sufficiently correct optical proximity effect, even under various situations with regard to size and shape of design pattern, and space width and position relation between design patterns
|
|
|
Assignment:
1
|
|
|
|
|
|
|
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
|
|
|
|
|
|
|
|
|
| 1753 SHIMONUMABE, NAKAHARA-KU, KAWASAKI |
| KANAGAWA 211-8668, JAPAN |
|
|
|
|
| HAYES SOLSOWAY P.C. |
| NORMAN P. SOLOWAY |
| 130 W. CUSHING STREET |
| TUCSON, AZ 85701 |
|
|
Search Results as of:
05/02/2024 09:38 AM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|
