Patent Assignment Abstract of Title
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
Total Assignments:
2
|
Patent #:
|
|
Issue Dt:
|
04/18/2006
|
Application #:
|
10027935
|
Filing Dt:
|
12/21/2001
|
Publication #:
|
|
Pub Dt:
|
06/20/2002
| | | | |
Inventors:
|
Gerard S. Moloney, Jason Price, Scott Chin, Jiro Kajiwara, Malek Charif
|
Title:
|
APPARATUS FOR CHEMICAL-MECHANICAL POLISHING (CMP) HEAD HAVING DIRECT PNEUMATIC WAFER POLISHING PRESSURE
|
|
Assignment:
1
|
|
|
|
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
|
|
|
|
|
|
1-5-1 OHTEMACHI, CHIYODA-KU |
TOKYO, JAPAN 100-8117 |
|
|
|
DORSEY & WHITNEY LLP |
R. MICHAEL ANANIAN, ESQ. |
SUITE 3400 |
FOUR EMBARCADERO CENTER |
SAN FRANCISCO, CA 94111-4187 |
|
|
Assignment:
2
|
|
|
|
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
|
|
|
|
|
|
11-1, HANEDA ASAHI-CHO |
OHTA-KU, TOKYO 144-8510, JAPAN |
|
|
|
DORSEY & WHITNEY LLP |
R. MICHAEL ANANIAN, ESQ. |
SUITE 3400 |
FOUR EMBARCADERO CENTER |
SAN FRANCISCO, CA 94111-4187 |
|
|
Search Results as of:
05/14/2024 08:34 AM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|