Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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09967812
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Filing Dt:
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09/28/2001
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Publication #:
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Pub Dt:
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08/01/2002
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Inventors:
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Hongqing Shan, Mahmoud Dahimene, Kenny L. Doan
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Title:
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Capacitively coupled reactive ion etch plasma reactor with overhead high density plasma source for chamber dry cleaning
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| P.O. BOX 450-A |
| SANTA CLARA, CALIFORNIA 95052 |
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| APPLIED MATERIALS, INC. |
| ROBERT W. MULCAHY |
| PATENT COUNSEL |
| P.O. BOX 450-A |
| SANTA CLARA, CA 95052 |
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