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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
10218413
Filing Dt:
08/15/2002
Publication #:
Pub Dt:
09/11/2003
Inventors:
Hitoshi Tamura, Seiichi Watanabe
Title:
Plasma processing device and plasma processing method
Assignment: 1
Reel/Frame:
013200/0742Recorded: 08/15/2002Pages: 2
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
08/05/2002
Exec Dt:
08/05/2002
Assignee:
1-24-14, NISHI SHIMBASHI
MINATO-KU
TOKYO 105-8717, JAPAN
Correspondent:
ANTONELLI, TERRY, STOUT ET AL.
WILLIAM I. SOLOMON
1300 NORTH SEVENTEENTH STREET
SUITE 1800
ARLINGTON, VA 22209

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