Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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NONE
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Issue Dt:
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Application #:
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10603689
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Filing Dt:
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06/26/2003
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Publication #:
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Pub Dt:
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02/12/2004
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Inventor:
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Hidetoshi Ohnuma
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Title:
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Exposure method, mask fabrication method, fabrication method of semiconductor device, and exposure apparatus
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Assignment:
1
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SEE RECORDING AT REEL 015290 FRAME 0049. (DOCUMENT RECORDED OVER TO CORRECT THE SERIAL NUMBER ERRONEOUSLY AFFIXED TO THE RECORDATION FORM COVER SHEET BY (OIPE) THE OFFICE OF INITIAL PATENT EXAMINATION)
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| 6-7-35 KITASHINAGAWA |
| SHINAGAWA-KU |
| TOKYO, JAPAN 141-0001 |
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| RADER, FISHMAN & GRAUER PLLC |
| RONALD P. KANANEN |
| 1233 20TH STREET, N.W. |
| SUITE 501 |
| WASHINGTON, DC 20036 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 6-7-35 KITASHINAGAWA |
| SHINAGAWA-KU |
| TOKYO, JAPAN 141-0001 |
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| RADER, FISHMAN & GRAUER, PLLC |
| RONALD P. KANANEN |
| 1233 20TH STREET, N.W. |
| SUITE 501 |
| WASHINGTON, DC 20036 |
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05/30/2024 02:49 AM
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