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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
NONE
Issue Dt:
Application #:
10377293
Filing Dt:
02/27/2003
Publication #:
20040171274
Pub Dt:
09/02/2004
Inventors:
Haoren Zhuang, Uwe Wellhausen, Ulrich Egger, Rainer Bruchhaus, Karl Hornik, Jingyu Lian et al
Title:
Method for formation of residue-free hardmask elements during a semiconductor device fabrication process
Assignment: 1
Reel/Frame:
014138/0551Recorded: 06/06/2003Pages: 8
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
ZHUANG, HAOREN
Exec Dt:
03/31/2003
EGGER, ULRICH
Exec Dt:
03/31/2003
WELLHAUSEN, UWE
Exec Dt:
03/31/2003
BRUCHHAUS, RAINER
Exec Dt:
03/31/2003
KORNICK, KARL
Exec Dt:
03/31/2003
LIAN, JINGYU
Exec Dt:
03/31/2003
BEITEL, GERHARD
Exec Dt:
03/31/2003
TOMIOKA, KAZUHIRO
Exec Dt:
05/07/2003
NATORI, KATSUAKI
Exec Dt:
05/07/2003
Assignees:
INFINEON TECHNOLOGIES AG
ST. MARTIN STR. 53
MUNICH, GERMANY 81669
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME
MINATO-KU
TOKYO, JAPAN
Correspondent:
LERNER, DAVID, LITTENBERG ET AL.
GREGORY S. GEWIRTZ
600 SOUTH AVENUE WEST
WESTFIELD, NJ 07090
Assignment: 2
Reel/Frame:
014833/0303Recorded: 12/29/2003Pages: 10
Conveyance:
CORRECTIVE ASSIGNMENT TO CORRECT DOCUMENT PREVIOUSLY RECORDED AT REEL 014138 FRAME 0551.
Assignors:
ZHUANG, HAOREN
Exec Dt:
03/31/2003
EGGER, ULRICH
Exec Dt:
03/31/2003
WELLHAUSEN, UWE
Exec Dt:
03/31/2003
BRUCHHAUS, RAINER
Exec Dt:
03/31/2003
HORNIK, KARL
Exec Dt:
03/31/2003
LIAN, JINGYU
Exec Dt:
03/31/2003
BEITEL, GERHARD
Exec Dt:
03/31/2003
TOMIOKA, KAZUHIRO
Exec Dt:
03/31/2003
NATORI, KATSUAKI
Exec Dt:
03/31/2003
Assignees:
INFINEON TECHNOLOGIES AG
ST. MARTIN STR. 53
81669 MUNICH, GERMANY
KABUSHIKI KAISHA TOSHIBA
1-1 SHIBAURA 1-CHOME, MINATO-KU
TOKYO 105-8001, JAPAN
Correspondent:
LERNER, DAVID, LITTENBERG, ET AL.
GREGORY S. GEWIRTZ
600 SOUTH AVENUE WEST
WESTFIELD, NJ 07090

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