Patent Assignment Abstract of Title
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
Total Assignments:
1
|
Patent #:
|
|
Issue Dt:
|
01/13/2009
|
Application #:
|
10852760
|
Filing Dt:
|
05/25/2004
|
Publication #:
|
|
Pub Dt:
|
12/02/2004
| | | | |
Inventors:
|
Jun Hatakeyama, Hideto Kato
|
Title:
|
RESIST LOWER LAYER FILM MATERIAL AND METHOD FOR FORMING A PATTERN
|
|
Assignment:
1
|
|
|
|
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
|
|
|
|
|
|
6-1, OHTEMACHI 2-CHOME |
CHIYODA-KU, TOKYO 100-0004, JAPAN |
|
|
|
OLIFF & BERRIDGE, PLC |
WILLIAM P. BERRIDGE |
P.O. BOX 19928 |
ALEXANDRIA, VA 22320 |
|
|
Search Results as of:
09/27/2024 06:41 AM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|