Patent Assignment Abstract of Title
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Total Assignments:
3
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Patent #:
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Issue Dt:
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05/06/2008
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Application #:
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10912841
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Filing Dt:
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08/06/2004
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Publication #:
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Pub Dt:
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02/10/2005
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Inventors:
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Toshio Banba, Takashi Hirano
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Title:
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POLYAMIDE RESIN, POSITIVE-WORKING PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN-FORMED RESIN FILM, SEMICONDUCTOR DEVICE, DISPLAY DEVICE, AND METHOD FOR PRODUCING THE SEMICONDUCTOR DEVICE AND THE DISPLAY DEVICE
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 5-8, HIGASHISHINAGAWA 2-CHOME |
| SHINAGAWA-KU, TOKYO, JAPAN 140-0002 |
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| ROBERT G. WEILACHER, ESQ. |
| 1230 PEACHTREE STREET, N.E. |
| SUITE 3100, PROMENADE II |
| ATLANTA, GA 30309-3592 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 5-8, HIGASHI-SHINAGAWA 2-CHOME |
| SHINAGAWA-KU, TOKYO, JAPAN |
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| ROBERT G. WEILACHER |
| 1230 PEACHTREE STREET |
| SUITE 1230, PROMENADE II |
| ATLANTA, GA 30309 |
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Assignment:
3
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 5-8, HIGASHISHINAGAWA 2-CHOME |
| SHINAGAWA-KU, TOKYO, JAPAN 140-0002 |
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| ROBERT G. WEILACHER |
| 1230 PEACHTREE STREET |
| SUITE 1230, PROMENADE II |
| ATLANTA, GA 30309 |
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