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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
04/15/2008
Application #:
10522036
Filing Dt:
01/19/2005
Publication #:
Pub Dt:
11/03/2005
Inventors:
Kenji Maruyama, Masaki Kurihara, Ken Miyagi, Kousuke Doi, Satoshi Niikura et al
Title:
CHEMICALLY AMPLIFIED POSITIVE PHOTO RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Assignment: 1
Reel/Frame:
016803/0276Recorded: 01/19/2005Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
12/16/2004
Exec Dt:
12/16/2004
Exec Dt:
12/16/2004
Exec Dt:
12/16/2004
Exec Dt:
12/16/2004
Exec Dt:
12/16/2004
Exec Dt:
12/16/2004
Exec Dt:
12/16/2004
Exec Dt:
12/16/2004
Assignee:
150, NAKAMARUKO, NAKAHARA-KU, KAWASAKI-SHI
KANAGAWA-KEN, JAPAN
Correspondent:
KNOBBE MARTENS OLSON & BEAR LLP
2040 MAIN STREET
FOURTEENTH FLOOR
IRVINE, CA 92614

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