Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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11510701
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Filing Dt:
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08/28/2006
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Publication #:
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Pub Dt:
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02/15/2007
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Inventors:
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Christoph Noelscher, Martin Verbeek, Christian Crell
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Title:
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Method for removing defect material of a lithography mask
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| GUSTAV-HELNEMANN |
| RING 212 |
| MUNCHEN, GERMANY 81739 |
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| KEVIN R. SPIVAK |
| MORRISON & FOERSTER LLP |
| 1650 TYSONS BLVD., SUITE 300 |
| MCLENA, VA 22102 |
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