Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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10/05/2010
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Application #:
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11317500
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Filing Dt:
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12/22/2005
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Publication #:
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Pub Dt:
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03/08/2007
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Inventor:
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Chan Ha Park
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Title:
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PHOTOMASK FOR DOUBLE EXPOSURE AND DOUBLE EXPOSURE METHOD USING THE SAME
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| SAN 136-1, AMI-RI, BUBAL-EUP GYUNGGI-DO |
| ICHEON-CHI, KOREA, REPUBLIC OF |
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| STEVE Y. CHO |
| TOWNSEND AND TOWNSEND AND CREW LLP |
| TWO EMBARCADERO CENTER, EIGHTH FLOOR |
| SAN FRANCISCO, CALIFORNIA 94111-3834 |
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Assignment:
2
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CORRECTIVE ASSIGNMENT TO CORRECT THE TITLE PREVIOUSLY RECORDED ON REEL 017385 FRAME 0587. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT.
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| SAN 136-1, AMI-RI, BUBAL-EUP, GYUNGGI-DO |
| ICHEON-SHI, KOREA, REPUBLIC OF |
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| BARMAK SANI |
| TOWNSEND AND TOWNSEND AND CREW LLP |
| TWO EMBARCADERO CENTER, EIGHTH FLOOR |
| SAN FRANCISCO, CA 94111-3834 |
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