Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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11595903
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Filing Dt:
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11/13/2006
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Publication #:
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Pub Dt:
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02/28/2008
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Inventors:
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Chih-Hsien Chung, Hsiao-Kuo Chang, Kuan-Hung Lin
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Title:
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Chemical vapor deposition reactor that pre-heats applied gas and substrate before reaction
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| NO. 10, YENG-PING S. RD. |
| TAIPEI, TAIWAN R.O.C. |
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| EUGENE MAR |
| BACON & THOMAS, PLLC |
| 625 SLATERS LANE, FOURTH FLOOR |
| ALEXANDRIA, VIRGINIA 22314 |
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