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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
11981930
Filing Dt:
10/31/2007
Publication #:
Pub Dt:
08/21/2008
Inventors:
David S. Mui, Wei Liu, Thorsten Lill, Yuxiang May Wang, Christopher Dennis Bencher
Title:
Etch pattern definition using a CVD organic layer as an anti-reflection coating and hardmask
Assignment: 1
Reel/Frame:
026560/0123Recorded: 07/08/2011Pages: 12
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
11/05/2001
Exec Dt:
11/05/2001
Exec Dt:
11/06/2001
Exec Dt:
11/09/2001
Exec Dt:
11/07/2001
Assignee:
3050 BOWERS AVENUE
SANTA CLARA, CALIFORNIA 95054
Correspondent:
PATTERSON & SHERIDAN, LLP
595 SHREWSBURY AVENUE
SUITE 100
SHREWSBURY, NJ 07702

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