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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
12163911
Filing Dt:
06/27/2008
Publication #:
Pub Dt:
05/07/2009
Inventors:
Yong-Soo KIM, Hong-Seon Yang, Heung-Jae Cho
Title:
METHOD FOR FORMING RADICAL OXIDE LAYER AND METHOD FOR FORMING DUAL GATE OXIDE LAYER USING THE SAME
Assignment: 1
Reel/Frame:
021219/0939Recorded: 07/10/2008Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
06/26/2008
Exec Dt:
06/26/2008
Exec Dt:
06/26/2008
Assignee:
SAN 136-1, AMI-RI, BUBAL-EUB
ICHON-SHI, KYOUNGKI-DO, KOREA, REPUBLIC OF 467-860
Correspondent:
STEVE Y. CHO
TOWNSEND AND TOWNSEND AND CREW LLP
TWO EMBARCADERO CENTER, EIGHTH FLOOR
SAN FRANCISCO, CA 94111-3834

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