Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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11884358
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Filing Dt:
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02/11/2008
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Publication #:
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Pub Dt:
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08/20/2009
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Inventors:
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Nobutoshi Fujii, Kazuo Kohmura, Hirofumi Tanaka, Shunsuke Oike, Masami Murakami et al
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Title:
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Method for Preparing Modified Porous Silica Films, Modified Porous Silica Films Prepared According to This Method and Semiconductor Devices Fabricated Using the Modified Porous Silica Films
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 2500 HAGISONO, CHIGASAKI |
| KANAGAWA, JAPAN 253-8543 |
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| 5-2, HIGASHI-SHIMBASHI 1-CHOME, MINATO-KU, |
| TOKYO, JAPAN 105-7117 |
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| 3-6 AKASAKA 5-CHOME MINATO-KU |
| TOKYO, JAPAN 107-8481 |
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| ARENT FOX LLP |
| 1050 CONNECTICUT AVENUE, N.W. |
| SUITE 400 |
| WASHINGTON, DC 20036 |
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