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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
Issue Dt:
03/16/2010
Application #:
12496585
Filing Dt:
07/01/2009
Publication #:
Pub Dt:
10/22/2009
Inventor:
Hiroshi Nomura
Title:
PHOTO MASK, FOCUS MEASURING METHOD USING THE MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Assignment: 1
Reel/Frame:
026312/0903Recorded: 05/19/2011Pages: 5
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignor:
Exec Dt:
05/19/2011
Assignee:
2357 KNOB HILL DRIVE
RIVERSIDE, CALIFORNIA 92506
Correspondent:
JOSEPH W. PRICE
600 ANTON BOULEVARD, SUITE 1400
COSTA MESA, CA 92626
Assignment: 2
Reel/Frame:
026346/0018Recorded: 05/26/2011Pages: 6
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignor:
Exec Dt:
05/23/2011
Assignee:
2302 LA MIRADA DRIVE
VISTA, CALIFORNIA 92081
Correspondent:
INTEGRA LIFESCIENCES CORPORATION
311 ENTERPRISE DRIVE
ATTN: LAW DEPT./ IP DIRECTOR
PLAINSBORO, NJ 08536

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