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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
Issue Dt:
05/06/2014
Application #:
12191957
Filing Dt:
08/14/2008
Publication #:
Pub Dt:
02/18/2010
Inventors:
Vlad Temchenko, Chinteong Lim, Jens Schneider, Yves Fabien Rody
Title:
Method for Exposing an Area on a Substrate to a Beam and Photolithographic System
Assignment: 1
Reel/Frame:
021487/0310Recorded: 09/05/2008Pages: 8
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
08/19/2008
Exec Dt:
08/25/2008
Exec Dt:
08/19/2008
Assignee:
AM CAMPEON 1-12
NEUBIBERG, GERMANY 85579
Correspondent:
SLATER & MATSIL, L.L.P.
17950 PRESTON RD.
SUITE 1000
DALLAS, TX 75252
Assignment: 2
Reel/Frame:
022861/0689Recorded: 06/23/2009Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignor:
Exec Dt:
04/21/2009
Assignee:
AM CAMPEON 1-12
NEUBIBERG, GERMANY 85579
Correspondent:
SLATER & MATSIL, L.L.P.
17950 PRESTON RD.
SUITE 1000
DALLAS, TX 75252

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