Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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NONE
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Issue Dt:
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Application #:
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12458352
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Filing Dt:
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07/08/2009
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Publication #:
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Pub Dt:
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03/18/2010
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Inventors:
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Sang-Woo Kim, Dong-Hyun Oh, Hye-In Shin, Hye-Ran Seong, Kyung-Jun Kim, Chan-Hyo Park
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Title:
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Block copolymer of polyimide and polyamic acid, method for producing the block copolymer, photosensitive resin composition comprising the block copolymer and protective film formed using the block copolymer
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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20, YEOUIDO-DONG |
YEONGDEUNGPO-GU |
SEOUL, KOREA, REPUBLIC OF |
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MCKENNA LONG & ALDRIDGE LLP |
1900 K STREET, N.W. |
WASHINGTON, DC 20006 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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20, YEOUIDO-DONG |
YEONGDEUNGPO-GU |
SEOUL, KOREA, REPUBLIC OF |
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MCKENNA LONG & ALDRIDGE LLP |
1900 K STREET, N.W. |
WASHINGTON, DC 20006 |
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