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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
8427631
Issue Dt:
04/23/2013
Application #:
12947825
Filing Dt:
11/17/2010
Publication #:
20110223393
Pub Dt:
09/15/2011
Inventors:
Hsiang-Chih Hsiao, Ta-Wen Liao, Chi-Min Yang, Shan-Fang Chen, Ya-Ping Chang et al
Title:
EXPOSURE APPARATUS, METHOD OF FORMING PATTERNED LAYER, METHOD OF FORMING PATTERNED PHOTORESIST LAYER, ACTIVE DEVICE ARRAY SUBSTRATE AND PATTERNED LAYER
Assignment: 1
Reel/Frame:
025410/0673Recorded: 11/19/2010Pages: 9
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
HSIAO, HSIANG-CHIH
Exec Dt:
10/05/2010
LIAO, TA-WEN
Exec Dt:
11/05/2010
YANG, CHI-MIN
Exec Dt:
11/03/2010
CHEN, SHAN-FANG
Exec Dt:
11/03/2010
CHANG, YA-PING
Exec Dt:
09/23/2010
YANG, CHI-HUNG
Exec Dt:
09/07/2010
LIAO, CHUNG-YUAN
Exec Dt:
09/07/2010
Assignee:
AU OPTRONICS CORPORATION
NO. 1, LI-HSIN RD. II, SCIENCE-BASED INDUSTRIAL PARK,
HSINCHU, TAIWAN
Correspondent:
JIANQ CHYUN INTELLECTUAL PROPERTY OFFICE
7F-1, NO. 100, SEC. 2, ROOSEVELT ROAD,
TAIPEI, 100 TAIWAN
Assignment: 2
Reel/Frame:
067797/0978Recorded: 06/20/2024Pages: 6
Conveyance:
CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
Assignor:
AU OPTRONICS CORPORATION
Exec Dt:
07/18/2022
Assignee:
AUO CORPORATION
NO. 1, LI-HSIN ROAD 2, SCIENCE-BASED INDUSTRIAL PARK
HSIN-CHU, TAIWAN
Correspondent:
JUSTIN KING
8230 BOONE BLVD. SUITE 405
VIENNA, VA 22182

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