Patent Assignment Abstract of Title
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Total Assignments:
4
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Patent #:
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Issue Dt:
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03/24/2015
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Application #:
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13840489
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Filing Dt:
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03/15/2013
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Publication #:
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Pub Dt:
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09/19/2013
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Inventors:
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Takeshi YAMANE, Tsuneo Terasawa
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Title:
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Method and Apparatus for Inspecting a Mask Substrate for Defects, Method of Manufacturing a Photomask, and Method of Manufacturing a Semiconductor Device
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 1-1, SHIBAURA 1-CHOME, MINATO-KU |
| TOKYO, JAPAN 105-8001 |
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| 1-1-1, ICHIGAYA KAGACHO, SHINJUKU-KU |
| TOKYO, JAPAN 162-8001 |
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| E. CHAPMAN - FHFGD |
| 901 NEW YORK AVE NW |
| WASHINGTON, DC 20001 |
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Assignment:
2
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| 1-1, SHIBAURA 1-CHOME |
| MINATO-KU, TOKYO, JAPAN |
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| JOHN M MULCAHY |
| 901 NEW YORK AVENUE, NW |
| WASHINGTON, DC 20001 |
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Assignment:
3
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MERGER AND CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
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Newly Merged Entity's New Name:
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| 1-1, SHIBAURA 1-CHOME |
| MINATO-KU, TOKYO, JAPAN |
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| JOHN M MULCAHY |
| 901 NEW YORK AVENUE, NW |
| WASHINGTON, DC 20001 |
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Assignment:
4
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CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
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| 1-21, SHIBAURA 3-CHOME |
| MINATO-KU, TOKYO, JAPAN |
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| JOHN M MULCAHY |
| 901 NEW YORK AVENUE, NW |
| WASHINGTON, DC 20001 |
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