Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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14246489
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Filing Dt:
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04/07/2014
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Publication #:
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Pub Dt:
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10/16/2014
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Inventors:
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Markus WEISS, Norbert KERWIEN, Martin WEISER, Boris BITTNER, Norbert WABRA et al
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Title:
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Reflective Optical Element for the EUV Wavelength Range, Method for Producing and for Correcting Such an Element, Projection Lens for Microlithography Comprising Such an Element, and Projection Exposure Apparatus for Microlithography Comprising Such a Projection Lens
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Assignment:
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| RUDOLF-EBER-STRASSE 2 |
| OBERKOCHEN, GERMANY 73447 |
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| GEORGE F. LEHNIGK |
| 9801 WASHINGTONIAN BLVD. |
| SUITE 750 |
| GAITHERSBURG, MD 20878 |
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