Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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07/17/2018
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Application #:
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15117686
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Filing Dt:
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08/09/2016
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Publication #:
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Pub Dt:
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12/08/2016
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Inventors:
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Seiichi TAGAWA, Seiji NAGAHARA, Akihiro OSHIMA
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Title:
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PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, METHOD FOR FORMING PATTERN USING SAME, SEMICONDUCTOR DEVICE, MASK FOR LITHOGRAPHY, AND TEMPLATE FOR NANOIMPRINTING
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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3-1 AKASAKA 5-CHOME |
MINATO-KU, TOKYO, JAPAN 107-6325 |
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1-1, YAMADAOKA |
SUITA-SHI, OSAKA, JAPAN 565-0871 |
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SQUIRE PB (SFR OFFICE) |
275 BATTERY STREET, SUITE 2600 |
SAN FRANCISCO, CA 94111-3356 |
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