Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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15550207
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Filing Dt:
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08/10/2017
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Publication #:
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Pub Dt:
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02/01/2018
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Inventors:
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Takumi TOIDA, Masatoshi ECHIGO, Takashi SATO, Takashi MAKINOSHIMA
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Title:
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COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD OF COMPOUND OR RESIN
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 5-2, MARUNOUCHI 2-CHOME, CHIYODA-KU |
| TOKYO, JAPAN 100-8324 |
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| FITCH EVEN TABIN & FLANNERY, LLP |
| 120 SOUTH LASALLE STREET |
| SUITE 1600 |
| CHICAGO, IL 60603-3406 |
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