Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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05/21/2019
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Application #:
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15961399
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Filing Dt:
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04/24/2018
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Publication #:
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Pub Dt:
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08/30/2018
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Inventors:
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Heine Melle MULDER, Andrey Sergeevich TYCHKOV, Willem VAN SCHAIK
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Title:
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EUV SOURCE CHAMBER AND GAS FLOW REGIME FOR LITHOGRAPHIC APPARATUS, MULTI-LAYER MIRROR AND LITHOGRAPHIC APPARATUS
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| P.O. BOX 324 |
| VELDHOVEN, NETHERLANDS 5500 AH |
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| ANTHONY W. SHAW |
| 1301 AVENUE OF THE AMERICAS |
| ARENT FOX LLP |
| NEW YORK, NY 10019 |
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