Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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12/10/2019
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Application #:
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15860912
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Filing Dt:
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01/03/2018
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Publication #:
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Pub Dt:
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03/28/2019
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Inventors:
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Ming-Shiang LIN, Chun-Chieh LU, Carlos H. DIAZ, Chia-Cheng HO, Cheng-Yi PENG et al
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Title:
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Method of Manufacturing a Semiconductor Device Having a Gate with Ferroelectric Layer
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| NO. 8, LI-HSIN RD. 6 |
| SCIENCE-BASED INDUSTRIAL PARK |
| HSINCHU, TAIWAN 300 |
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| MCCLURE, QUALEY & RODACK, LLP |
| 3100 INTERSTATE NORTH CIRCLE |
| SUITE 150 |
| ATLANTA, GA 30339 |
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