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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
06/27/2023
Application #:
16025913
Filing Dt:
07/02/2018
Publication #:
Pub Dt:
07/25/2019
Inventors:
Kei-Wei Chen, Chih Hung Chen, Ying-Lang Wang
Title:
POLISHING PAD FOR CHEMICAL MECHANICAL PLANARIZATION
Assignment: 1
Reel/Frame:
046430/0853Recorded: 07/23/2018Pages: 2
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
05/24/2018
Exec Dt:
05/29/2018
Exec Dt:
05/21/2018
Assignee:
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK
HSINCHU, TAIWAN 300-78
Correspondent:
SLATER MATSIL, LLP/TSMC
17950 PRESTON ROAD, SUITE 1000
DALLAS, TX 75252

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