Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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02/13/2024
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Application #:
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16958866
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Filing Dt:
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06/29/2020
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Publication #:
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Pub Dt:
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02/25/2021
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Inventors:
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Takashi FUKE, Katsuto TANIGUCHI, Naofumi YOSHIDA, Megumi TAKAHASHI, Toshiaki NONAKA
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Title:
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PHOTOSENSITIVE SILOXANE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| FRANKFURTER STRASSE 250 |
| DARMSTADT, GERMANY 64293 |
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| FAEGRE DRINKER BIDDLE & REATH LLP (WM) |
| ATTN: INTELLECTUAL PROPERTY GROUP |
| ONE LOGAN SQUARE, SUITE 2000 |
| PHILADELPHIA, PA 19103-6996 |
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