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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
11721586
Issue Dt:
08/08/2023
Application #:
16721083
Filing Dt:
12/19/2019
Publication #:
20210193524
Pub Dt:
06/24/2021
Inventors:
Ernst Eiper, Antonius Hendrikus Jozef Kamphuis, Johannes Cobussen, Chantal Dijkstra
Title:
Method and System for Regulating Plasma Dicing Rates
Assignment: 1
Reel/Frame:
051439/0988Recorded: 01/07/2020Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
KAMPHUIS, ANTONIUS HENDRIKUS JOZEF
Exec Dt:
12/17/2019
EIPER, ERNST
Exec Dt:
12/20/2019
COBUSSEN, JOHANNES
Exec Dt:
12/17/2019
DIJKSTRA, CHANTAL
Exec Dt:
12/27/2019
Assignee:
NXP B.V.
HIGH TECH CAMPUS 60
EINDHOVEN, NETHERLANDS NL-5656 AG
Correspondent:
INTELLECTUAL PROPERTY AND LICENSING NXP
411 EAST PLUMERIA DRIVE, MS41
SAN JOSE, CA 95134
Assignment: 2
Reel/Frame:
063943/0608Recorded: 06/14/2023Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
KAMPHUIS, ANTONIUS HENDRIKUS JOZEF
Exec Dt:
12/17/2019
EIPER, ERNST
Exec Dt:
12/20/2019
COBUSSEN, JOHANNES
Exec Dt:
12/17/2019
DIJKSTRA, CHANTAL CLAUDE
Exec Dt:
12/27/2019
Assignee:
B.V., NXP, B.V.
HIGH TECH CAMPUS 60
EINDHOVEN, NETHERLANDS 5656 AG
Correspondent:
NXP B.V.
350 HOLGER WAY
SAN JOSE, CA 95134

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