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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
07/26/2022
Application #:
16787229
Filing Dt:
02/11/2020
Publication #:
Pub Dt:
08/12/2021
Inventors:
Yu-Jiun Peng, Hsiu-Hao Tsao, Shu-Han Chen, Chang-Jhih Syu, Kuo-Feng Yu, Jian-Hao Chen et al
Title:
Methods for Manufacturing a Transistor Gate by Non-Directional Implantation of Impurities in a Gate Spacer
Assignment: 1
Reel/Frame:
051996/0048Recorded: 03/03/2020Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
02/13/2020
Exec Dt:
02/13/2020
Exec Dt:
02/13/2020
Exec Dt:
02/13/2020
Exec Dt:
02/13/2020
Exec Dt:
02/14/2020
Exec Dt:
02/13/2020
Exec Dt:
02/13/2020
Assignee:
8, LI-HSIN RD. 6
HSINCHU SCIENCE PARK
HSINCHU, TAIWAN 300-78
Correspondent:
SLATER MATSIL, LLP/TSMC
17950 PRESTON ROAD, SUITE 1000
DALLAS, TX 75252

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