Patent Assignment Abstract of Title
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
Total Assignments:
1
|
Patent #:
|
|
Issue Dt:
|
09/19/2023
|
Application #:
|
17722582
|
Filing Dt:
|
04/18/2022
|
Publication #:
|
|
Pub Dt:
|
07/28/2022
| | | | |
Inventors:
|
Chun-Hsiung Lin, Chih-Hao Wang, Jui-Chien Huang, Shih-Cheng Chen, Jung-Hung Chang
|
Title:
|
Methods of Forming Silicide Contact in Field-Effect Transistors
|
|
Assignment:
1
|
|
|
|
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
|
|
|
|
|
|
8, LI-HSIN RD. 6 |
HSINCHU SCIENCE PARK |
HSINCHU, TAIWAN 300-78 |
|
|
|
HAYNES AND BOONE, LLP |
2323 VICTORY AVENUE |
SUITE 700 |
DALLAS, TX 75219 |
|
|
Search Results as of:
09/23/2024 03:54 PM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|