Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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17735647
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Filing Dt:
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05/03/2022
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Publication #:
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Pub Dt:
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12/22/2022
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Inventors:
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Keiichi MASUNAGA, Kenji FUNATSU, Masaaki KOTAKE, Naoya INOUE
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Title:
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CHEMICALLY AMPLIFIED RESIST COMPOSITION, PHOTOMASK BLANK, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING POLYMER COMPOUND
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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4-1, MARUNOUCHI 1-CHOME, CHIYODA-KU |
TOKYO, JAPAN 100-0005 |
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AARON L. WEBB |
OLIFF PLC |
P.O. BOX 320850 |
ALEXANDRIA, VA 22320-4850 |
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05/22/2024 06:11 AM
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