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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
NONE
Issue Dt:
Application #:
17679749
Filing Dt:
02/24/2022
Publication #:
Pub Dt:
02/09/2023
Inventors:
Johan Hofkens, Flip de Jong, Sukjong Bae, Haifeng Yuan
Title:
PHOTORESIST INSPECTION APPARATUS, PHOTORESIST INSPECTION METHOD USING THE SAME, AND ELECTRON BEAM EXPOSURE APPARATUS
Assignment: 1
Reel/Frame:
059372/0279Recorded: 03/23/2022Pages: 8
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
02/08/2022
Exec Dt:
02/08/2022
Exec Dt:
02/07/2022
Assignee:
KU LEUVEN R&D
WAAISTRAAT 6-BOX 5105
LEUVEN, BELGIUM 3000
Correspondent:
CAREY GREGORY/MYERS BIGEL
PO BOX 37428
RALEIGH, NC 27627
Assignment: 2
Reel/Frame:
059372/0149Recorded: 03/23/2022Pages: 8
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignor:
Exec Dt:
02/22/2022
Assignee:
129, SAMSUNG-RO, YEONGTONG-GU
SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF 16677
Correspondent:
CAREY GREGORY/MYERS BIGEL
PO BOX 37428
RALEIGH, NC 27627

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